The YES vacuum oven that can be used for HMDS vapor priming. Using hexamethyldisilazane (HMDS)- the unit functions as a standard vacuum vapor primer. Clean wafers are dehydrated through a series of heated (150C) evacuation and dry N2 (nitrogen) refills. HMDS vapor then evaporates into the evacuated chamber forming a monolayer on the wafer surfaces. Vapor priming is used to improve the adhesion of the photoresist to the wafer.
Instrument specifications are provided on labs portal: https://labs.masdar.ac.ae/index.php/equipment-portal